• DocumentCode
    1384238
  • Title

    Beyond 100 GHz AlN/GaN HEMTs on silicon substrate

  • Author

    Medjdoub, F. ; Zegaoui, M. ; Rolland, Nathalie

  • Author_Institution
    Inst. of Electron., Microelectron. & Nanotechnol. (IEMN), Villeneuve d´Ascq, France
  • Volume
    47
  • Issue
    24
  • fYear
    2011
  • Firstpage
    1345
  • Lastpage
    1346
  • Abstract
    A report is presented on high-speed 100 nm AlN/GaN high-electron-mobility transistors (HEMTs) grown on (111) high-resistive silicon substrate. The device delivers an extrinsic peak transconductance gm=530=mS/mm, a maximum current of 1.74=A/mm, and current gain and maximum oscillation cutoff frequencies of ft=103=GHz and fmax=162=GHz, which represent the highest cutoff frequencies for AlN/GaN HEMTs on silicon substrate. The results show the outstanding potential of this material system grown on silicon for low-cost high-power millimetre-wave applications.
  • Keywords
    III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; millimetre wave transistors; silicon; wide band gap semiconductors; AlN-GaN; HEMT; Si; extrinsic peak transconductance; frequency 103 GHz; high electron mobility transistor; high power millimetre wave application; silicon substrate; size 100 nm;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el.2011.3166
  • Filename
    6088058