Title :
Study of narrow tracks written with FeAlN write heads
Author :
Jayasekara, W.P. ; Roesler, A. ; Kryder, M.H.
Author_Institution :
Dept. of Electr. & Comput. Eng., Carnegie Mellon Univ., Pittsburgh, PA, USA
fDate :
9/1/1996 12:00:00 AM
Abstract :
Thin film inductive write heads with track-widths down to 0.7 μm were fabricated by trimming wide track-width heads using focused ion beam etching from the slider air bearing surface. These heads incorporated FeAlN high moment pole material. They were observed to saturate media with coercivity of 2950 Oe. In this work, magnetic force microscopy (MFM) is used to evaluate tracks written by these heads. Sharply defined track edges were observed even for the narrow track-width heads up to high linear density. Simulations using accepted models for wide track writing agree with some of the experimentally observed trends for the submicron tracks
Keywords :
aluminium alloys; coercive force; focused ion beam technology; iron alloys; magnetic force microscopy; magnetic heads; magnetic thin film devices; sputter etching; 0.7 mum; FeAlN; FeAlN write heads; TW50; cross-track profile; focused ion beam etching; high coercivity media; high moment pole material; magnetic force microscopy; media saturation curves; sharply defined track edges; side profile shallowness; simulations; slider air bearing surface; submicron tracks; thin film inductive write heads; track width; wide track writing models; Coercive force; Frequency; Ion beams; Magnetic field measurement; Magnetic force microscopy; Magnetic heads; Magnetic materials; Magnetic recording; Sputter etching; Target tracking;
Journal_Title :
Magnetics, IEEE Transactions on