Title :
Undoped maghemite thin films with coercivity up to 2100 Oe for magnetic recording
Author :
Chang, W.D. ; Chin, T.S.
Author_Institution :
Synchrotron Radiat. Res. Center, Taipei, Taiwan
fDate :
9/1/1996 12:00:00 AM
Abstract :
Undoped thin γ-Fe2O3 films were deposited in-situ on Si substrate under well controlled O2 partial pressure by dc-reactive magnetron sputtering Fe3O4 phase then controlled oxidation to become the maghemite phase at 360°C for 10 min. The coercivity of as-deposited magnetite films is around 400~640 Oe. After oxidation at 320-360°C for 10 minutes, the films transform to maghemite γ-Fe2O3 completely, and the coercivity is increased 1~4 times to 640~2100 Oe, depending on oxygen flow rate during deposition and the thermal history. The origin of coercivity enhancement is attributed to magnetoanisotropy which is induced by the interfacial stress of the films. These films show potential for high density magnetic recording applications due to simplified processing, high coercivity, wear and corrosion resistance
Keywords :
coercive force; ferrimagnetic materials; induced anisotropy (magnetic); iron compounds; magnetic recording; magnetic thin films; oxidation; sputtered coatings; 320 to 360 C; DC-reactive magnetron sputtering; Fe2O3; Si substrate; coercivity; corrosion resistance; high density magnetic recording; interfacial stress; maghemite phase; magnetoanisotropy; oxidation; undoped γ-Fe2O3 thin film; wear; Coercive force; History; Iron; Magnetic films; Oxidation; Pressure control; Semiconductor films; Sputtering; Thermal stresses; Transistors;
Journal_Title :
Magnetics, IEEE Transactions on