• DocumentCode
    1385196
  • Title

    Interactions of the directed plasma from a cathodic arc with electrodes and magnetic fields

  • Author

    Bilek, Marcela M.M. ; McKenzie, David R. ; Yin, Yongbai ; Chhowalla, Manish U. ; Milne, William I.

  • Author_Institution
    Dept. of Eng., Cambridge Univ., UK
  • Volume
    24
  • Issue
    5
  • fYear
    1996
  • fDate
    10/1/1996 12:00:00 AM
  • Firstpage
    1291
  • Lastpage
    1298
  • Abstract
    Curved magnetic ducts are frequently used to remove macroscopic-sized droplets from the plasma stream of cathodic vacuum arcs. The plasma of a cathodic vacuum arc in a magnetic filter is characterized by a strongly directional ion velocity (corresponding to 20-100 eV) and magnetized electrons. In the first section of this paper the effects of these features on the I-V characteristic curves of planar probes are identified and explained using a simple model. This is then used to interpret the interaction of the plasma with the walls of a biased quarter torus duct. Two small electrodes placed on the outer and inner sections of the curved duct wall show that the I-V characteristic is determined primarily by the electron-ion current balance at the wall on the outside of the curve. The application of a bias to a planar electrode on the outer wall section was found to give the same increase in throughput as a positive bias applied to the entire duct with the advantage of a much smaller electron current being drawn by the biasing power supply. The improvement in duct throughput achievable with positive-biasing of the duct wall was found to depend on both the configuration and strength of the magnetic field in the quarter torus filter. The plasma density profile and potential were unaffected by the application of the bias
  • Keywords
    cathodes; plasma collision processes; plasma density; plasma probes; plasma toroidal confinement; plasma transport processes; plasma-wall interactions; vacuum arcs; 20 to 100 eV; I-V characteristic curves; biased quarter torus duct; biasing power supply; cathodic arc; cathodic vacuum arcs; curved magnetic ducts; directed plasma; duct throughput; electrodes; electron-ion current balance; macroscopic-sized droplets; magnetic fields; magnetic filter; magnetized electrons; outer wall section; planar electrode; planar probes; plasma density profile; plasma potential; plasma stream; positive bias; quarter torus filter; strongly directional ion velocity; Ducts; Electrodes; Electrons; Magnetic separation; Plasma applications; Plasma properties; Power supplies; Probes; Throughput; Vacuum arcs;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.538803
  • Filename
    538803