DocumentCode :
1385824
Title :
Ultramicro fabrications on Fe-Ni alloys using electron-beam writing and reactive-ion etching
Author :
Nakatani, Isao
Author_Institution :
Nat. Res. Inst. for Metals, Tsukuba, Japan
Volume :
32
Issue :
5
fYear :
1996
fDate :
9/1/1996 12:00:00 AM
Firstpage :
4448
Lastpage :
4451
Abstract :
A novel reactive-ion-etching (RIE) method useful for ferromagnetic material of Permalloy (80%Ni-4.5%Mo-Fe) has been developed. This method involves rf plasma of a gas mixture NH3-CO aimed at the formation of volatile transition metal carbonyls. A maximum etching rate of 35 nm/min and highly anisotropic etching was obtained. The etching selectivity ratios of Permalloy to SiO2 or Si were about 10 or 4, respectively. High-resolution electron-beam writing was followed by the RIE process on the Permalloy films. To achieve high-resolution electron-beam writing, amorphous carbon film was placed between the resist layer and SiO2 film overlaid on the Permalloy film. By this method, nanostructures of Permalloy stripes of 200 nm lines and 300 nm spaces with clear-cut features were fabricated
Keywords :
Permalloy; electron beam lithography; ferromagnetic materials; sputter etching; 200 nm; 300 nm; Fe-Ni alloys; FeNi; Permalloy; Permalloy stripes; RF plasma; RIE; SiO2 film; amorphous carbon film; electron-beam writing; etching selectivity ratios; ferromagnetic material; highly anisotropic etching; maximum etching rate; nanostructures; reactive-ion etching; resist layer; ultramicro fabrications; volatile transition metal carbonyls; Amorphous materials; Anisotropic magnetoresistance; Etching; Fabrication; Magnetic materials; Nanostructures; Plasma applications; Plasma materials processing; Resists; Writing;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/20.538896
Filename :
538896
Link To Document :
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