Magnetoresistance and morphology in magnetic multilayers by insertion of very thin Fe, Co layers

Author

Hwang, D.G. ; Lee, S.S. ; Lee, K.A. ; Park, C.M. ; Kim, M.Y. ; Choi, K.R. ; Choi, S.J. ; Lee, Y.H. ; Rhee, J.R.

Author_Institution

Dept. of Phys., Sangji Univ., Wonju, South Korea

Volume

32

Issue

5

fYear

1996

fDate

9/1/1996 12:00:00 AM

Firstpage

4579

Lastpage

4581

Abstract

Dependences of magnetoresistance and morphology upon the insertion of very thin magnetic layers at interfaces between magnetic and nonmagnetic layers in Co/Cu and Ni₈₁Fe₁₉/Cu multilayers have been investigated. The Co/Cu multilayers with inserted Fe thickness of 0.5~1.0 Å have the MR ratio of about 18% more than the noninserted multilayers, and the MR ratio in the NiFe/Cu multilayers with inserted Co of thickness of 3 Å was found to be significantly increased. These results can be explained by the enhanced interlayer antiferromagnetic coupling and spin-dependent scattering phenomena at the interface. Of particular interest, the “Clustered out-growth” in the surface morphology of these multilayers was observed

Keywords

cobalt; copper; ferromagnetic materials; iron; iron alloys; magnetic multilayers; magnetoresistance; nickel alloys; sputtered coatings; surface structure; Co-Fe-Cu; Ni₈₁Fe₁₉-Co-Cu; interlayer antiferromagnetic coupling; magnetic multilayers; magnetoresistance; spin-dependent scattering; surface morphology; very thin magnetic layers; Antiferromagnetic materials; Giant magnetoresistance; Iron; Magnetic field measurement; Magnetic films; Magnetic multilayers; Physics; Saturation magnetization; Scattering; Surface morphology;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.539085

Filename

539085