Title :
Improvement of the magnetic characteristics of multilayered Ni-Fe thin films by applying external in-plane field during sputtering
Author :
Ichihara, Takayulu ; Nakagawa, Shigelu ; Naoe, Masako
Author_Institution :
Dept. of Phys. Electron., Tokyo Inst. of Technol., Japan
fDate :
9/1/1996 12:00:00 AM
Abstract :
Ni79Fe21 single layers and multilayers composed of Ni79Fe21 layers and paramagnetic Al interlayers were deposited using the facing targets sputtering (FTS) apparatus. During layer deposition, the external field Hex of 200 Oe along the film plane was applied parallel or transverse to the direction of the plasma confining field Hp of about 30 Oe in the FTS apparatus. The application of Hex parallel to the H p direction was not significantly effective for improving soft magnetic characteristics of the films. When Hex was applied transverse to the Hp direction, the relative permeability μr of the Ni-Fe single layers 100 nm-thick was increased, while the coercivity Hc and the squareness ratio Mr/Ms of them were not varied. On the other hand, μr of the [Ni-Fe/Al]5 multilayers was extremely and isotropically increased while Mr/Ms for the multilayers was decreased down to a half value
Keywords :
coercive force; ferromagnetic materials; iron alloys; magnetic annealing; magnetic multilayers; magnetic permeability; magnetic thin films; nickel alloys; soft magnetic materials; sputtered coatings; Ni79Fe21; Ni79Fe21 single layers; coercivity; external in-plane field; magnetic characteristics; multilayered Ni-Fe thin films; paramagnetic Al interlayers; permeability; soft magnetic characteristics; sputtering; squareness ratio; Iron; Magnetic confinement; Magnetic multilayers; Nonhomogeneous media; Paramagnetic materials; Plasma applications; Plasma confinement; Plasma properties; Soft magnetic materials; Sputtering;
Journal_Title :
Magnetics, IEEE Transactions on
