Title :
Investigations of GMR characteristics and crystal structures for Ni 81Fe19/Cu multilayers with Ar ion bombardment on interfaces
Author :
Miyamoto, Yasuyoshi ; Yoshitani, Tohru ; Nakagawa, Shigeki ; Naoe, Masahiko
Author_Institution :
Dept. of Phys. Electron., Tokyo Inst. of Technol., Japan
fDate :
9/1/1996 12:00:00 AM
Abstract :
Ni81Fe19/Cu multilayers with giant magnetoresistance were deposited by dual ion beam sputtering method, which can control the crystallite orientation and interfacial structure by adjusting preparation conditions. In this study, only a few monolayers at interfaces in Ni81Fe19/Cu multilayers were exposed to ion bombardment to change the interfacial conditions, such as sharp interface, the local mixing and the interfacial diffusion. Ion bombardment to interfaces at restricted acceleration voltage of 160 V and reduction of recoiled Ar incidence seems to be effective for attaining preferable GMR characteristics, where clear interfaces and the best crystallinity seems to be constructed in the multilayers
Keywords :
chemical interdiffusion; copper; crystallites; ferromagnetic materials; giant magnetoresistance; interface structure; ion beam effects; iron alloys; magnetic multilayers; nickel alloys; sputtered coatings; 160 V; Ar ion bombardment; GMR characteristics; Ni81Fe19-Cu; Ni81Fe19/Cu multilayers; crystal structures; crystallinity; crystallite orientation; dual ion beam sputtering method; giant magneto-resistance; interfaces; interfacial conditions; interfacial diffusion; interfacial structure; ion bombardment; local mixing; preparation conditions; recoiled Ar incidence; restricted acceleration voltage; sharp interface; Acceleration; Argon; Crystallization; Giant magnetoresistance; Ion beams; Iron; Magnetic multilayers; Nonhomogeneous media; Sputtering; Voltage;
Journal_Title :
Magnetics, IEEE Transactions on
