Improvement of low field magnetostriction of amorphous TbFe sputtered films by thermal annealing

Author

Inoue, M. ; Fujii, T. ; Gibbs, M.R.J.

Author_Institution

Dept. of Electr. & Electron. Eng., Toyohashi Univ. of Technol., Japan

Volume

32

Issue

5

fYear

1996

fDate

9/1/1996 12:00:00 AM

Firstpage

4758

Lastpage

4760

Abstract

To improve the low field magnetostrictive response of TbFe sputtered films, the effects of slow rate and rapid rate thermal annealing on the magnetic and magnetoelastic properties of the films were investigated. The annealing was achieved for amorphous TbFe films with the composition around 40 at.% Tb, because these films simultaneously exhibit relatively soft inplane magnetization and considerably large magnetostriction. The present work shows that thermal annealing is very effective for improving the low field magnetostrictive response of a film, for example, the engineering magnetostriction of amorphous Tb₄₀Fe₆₀ film at 500 Oe became 5.1 times larger by annealing from 46×10^-6 to 235×10^-6

Keywords

amorphous magnetic materials; annealing; ferromagnetic materials; iron alloys; magnetisation; magnetoelastic effects; magnetostriction; soft magnetic materials; sputtered coatings; terbium alloys; Tb₄₀Fe₆₀; amorphous Tb₄₀Fe₆₀ film; amorphous TbFe sputtered films; engineering magnetostriction; inplane magnetization; low field magnetostriction; magnetic properties; magnetoelastic properties; thermal annealing; Amorphous magnetic materials; Amorphous materials; Coercive force; Magnetic anisotropy; Magnetic films; Magnetic properties; Magnetostriction; Perpendicular magnetic anisotropy; Rapid thermal annealing; Saturation magnetization;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.539142

Filename

539142