Title :
Isotropic in-plane external stressing of ferromagnetic films
Author :
Callegaro, Luca ; Puppin, Ezio
Author_Institution :
Istituto di Fisica, Politecnico di Milano, Italy
fDate :
9/1/1996 12:00:00 AM
Abstract :
Magnetoelastic effects due to internal stress strongly influence the magnetic properties of thin ferromagnetic films. Here we propose a method to create a tensile stress state, isotropic along the plane of the film, which superimposes on the intrinsic stress (also normally isotropic). Thus the study of the effects of deposition or epitaxial stresses onto anisotropy properties of thin films becomes feasible. As an application, magneto-optical polar Kerr hysteresis loop measurements have been carried out on Ni films electroplated on elastic bronze substrates; the magnetoelastic anisotropy created reduces the total in-plane anisotropy field of about 20% for a radial deformation of 3·10-3, around 100 times the saturation magnetostriction of bulk Ni
Keywords :
Kerr magneto-optical effect; ferromagnetic materials; internal stresses; magnetic anisotropy; magnetic epitaxial layers; magnetic hysteresis; magnetoelastic effects; magnetostriction; nickel; Ni; Ni films; anisotropy; epitaxial stresses; ferromagnetic films; internal stress; isotropic in-plane external stressing; magneto-optical polar Kerr hysteresis loop measurements; magnetoelastic anisotropy; magnetoelastic effects; radial deformation; saturation magnetostriction; tensile stress state; total in-plane anisotropy field; Anisotropic magnetoresistance; Internal stresses; Magnetic anisotropy; Magnetic films; Magnetic properties; Magnetostriction; Perpendicular magnetic anisotropy; Saturation magnetization; Sputtering; Tensile stress;
Journal_Title :
Magnetics, IEEE Transactions on