A 2 Degree-of-Freedom SOI-MEMS Translation Stage With Closed-Loop Positioning

Author

Koo, Bonjin ; Zhang, Xuemeng ; Dong, Jingyan ; Salapaka, Srinivasa M. ; Ferreira, Placid M.

Author_Institution

Dept. of Mech. Sci. & Eng., Univ. of Illinois at Urbana-Champaign, Urbana, IL, USA

Volume

21

Issue

1

fYear

2012

Firstpage

13

Lastpage

22

Abstract

This paper presents the design, analysis, fabrication, and characterization of a closed-loop XY micropositioning stage. The stage design is based on a 2 degree-of-freedom parallel kinematic mechanism with linear characteristics. Integrated with sensing combs, and fabricated in SOI wafers, the design provides a promising pathway to closed-loop positioning microelectromechanical systems platform with applications in nanomanufacturing and metrology. The XY stage provides a motion range of 20 micrometers in each direction at the driving voltage of 100 V. The resonant frequency of the XY stage under ambient conditions is 600 Hz. The positioning loop is closed using a capacitance-to-voltage conversion IC and a feedback controller is used to control position with an uncertainty characterized by a standard distribution of 5.24 nm and a closed-loop bandwidth of about 30 Hz.

Keywords

micromechanical devices; micropositioning; silicon-on-insulator; 2 degree-of-freedom parallel kinematic; SOI wafer; SOI-MEMS translation; capacitance-to-voltage conversion IC; closed-loop XY micropositioning stage; closed-loop positioning stage; feedback controller; frequency 600 Hz; linear characteristic; metrology; microelectromechanical system; nanomanufacturing; resonant frequency; voltage 100 V; Actuators; Capacitance; Fasteners; Kinematics; Sensors; Silicon; Springs; Closed-loop control; MEMS-scale nanopositioner; nanopositioning; parallel kinematic mechanism;

fLanguage

English

Journal_Title

Microelectromechanical Systems, Journal of

Publisher

ieee

ISSN

1057-7157

Type

jour

DOI

10.1109/JMEMS.2011.2174425

Filename

6094148