Title :
TM-pass polarizer based on a photobleaching-induced waveguide in polymers
Author :
Sang-Shin Lee ; Garner, S. ; Chen, A. ; Chuyanov, V. ; Steier, W.H. ; Seh-Won Ahn ; Sang-Yung Shin
Author_Institution :
Dept. of Electr. Eng.-Electrophys., Univ. of Southern California, Los Angeles, CA, USA
fDate :
6/1/1998 12:00:00 AM
Abstract :
An integrated optical TM-pass polarizer was fabricated by utilizing a photobleaching-induced birefringence in polymers. The polarizer is implemented by integrating a photobleached waveguide supporting only the TM mode between input and output etched rib waveguides supporting both TE and TM modes. The photobleaching has been controlled to reduce the excess loss by closely matching the mode profiles of the waveguides. The measured polarization extinction ratio is 25 dB, and the excess loss is about 0.4 dB at the wavelength of 1.31 μm.
Keywords :
birefringence; integrated optics; optical polarisers; optical polymers; optical saturable absorption; optical waveguides; rib waveguides; TM mode; TM-pass polarizer; excess loss; input etched rib waveguides; integrated optical TM-pass polarizer fabrication; measured polarization extinction ratio; mode profiles; optical polymers; output etched rib waveguides; photobleached waveguide; photobleaching control; photobleaching-induced birefringence; photobleaching-induced waveguide; Birefringence; Etching; Integrated optics; Loss measurement; Optical losses; Optical polarization; Optical polymers; Optical waveguides; Photobleaching; Tellurium;
Journal_Title :
Photonics Technology Letters, IEEE
