• DocumentCode
    1389502
  • Title

    Mechanism of charge storage in electron-beam or corona-charged silicon-dioxide electrets

  • Author

    Günther, P.

  • Author_Institution
    Inst. for Electroacoust., Tech. Univ. of Darmstadt, Germany
  • Volume
    26
  • Issue
    1
  • fYear
    1991
  • fDate
    2/1/1991 12:00:00 AM
  • Firstpage
    42
  • Lastpage
    48
  • Abstract
    Thermally-stimulated-discharge (TSD) measurements performed to investigate the electret charges on 1-μm-thick, wet-grown SiO2 are discussed. Charge decay curves at room temperature for a time period of more than three years are given. Influences of charging methods and substrate doping on charge stability are also discussed. Measurements of charge decay in short- and open-circuit TSD experiments show interesting phenomena that are interpreted, including discharge current peaks at temperatures >250°C that were found in positively charged samples. An unexpected current reversal was observed in these experiments, and an explanation for this reversal is given. The generation by irradiation of traps in the bulk of SiO2 with an electron beam is described. The Sessler method is used to calculate the traps´ mean-spatial depths
  • Keywords
    electrets; electron traps; silicon compounds; thermally stimulated currents; 1 micron; 250 degC; 3 y; Sessler method; TSD measurements; charge decay curves; charge stability; charge storage mechanism; charging methods; corona-charged SiO2 electrets; current reversal; discharge current peaks; electret charges; electron beam charged SiO2 electrets; electron beam generated traps; open-circuit TSD experiments; positively charged samples; room temperature; short-circuit TSD experiments; substrate doping; thermally stimulated discharge; time period; traps´ mean-spatial depths; Charge measurement; Corona; Current measurement; Electrets; Polymers; Silicon; Stability; Substrates; Surface charging; Temperature sensors;
  • fLanguage
    English
  • Journal_Title
    Electrical Insulation, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9367
  • Type

    jour

  • DOI
    10.1109/14.68225
  • Filename
    68225