Title :
Very low insertion loss arrayed-waveguide grating with vertically tapered waveguides
Author :
Sugita, A. ; Kaneko, A. ; Okamoto, K. ; Itoh, M. ; Himeno, A. ; Ohmori, Y.
Author_Institution :
NTT Photonics Labs., Ibaraki, Japan
Abstract :
We propose and demonstrate a very low insertion loss silica-based arrayed-waveguide grating (AWG) achieved using a novel structure, which has vertically tapered waveguides between arrayed-waveguides to reduce the slab-to-arrayed-waveguide transition loss. A spot-size converter is also incorporated in the AWG to reduce the fiber-to-waveguide coupling loss. The structure can be formed by a process involving the conventional photolithography and reactive ion etching. The structure provided a loss reduction of 1.5 dB. Moreover, we have successfully obtained a minimum insertion loss of 0.75 dB with a crosstalk of -40 dB and polarization-independent operation.
Keywords :
diffraction gratings; integrated optics; optical arrays; optical communication equipment; optical crosstalk; optical fibre couplers; optical losses; optical waveguides; photolithography; sputter etching; 0.75 dB; arrayed-waveguides; crosstalk; fiber-to-waveguide coupling loss; minimum insertion loss; photolithography; polarization-independent operation; reactive ion etching; slab-to-arrayed-waveguide transition loss; spot-size converter; vertically tapered waveguides; very low insertion loss arrayed-waveguide grating; very low insertion loss silica-based arrayed-waveguide grating; Arrayed waveguide gratings; Etching; Insertion loss; Lithography; Optical fiber polarization; Optical losses; Optical waveguides; Slabs; Waveguide junctions; Waveguide transitions;
Journal_Title :
Photonics Technology Letters, IEEE