On-wafer electrooptic probing using rotational deformation modulation

Author

Chen, W.H. ; Kuo, W.K. ; Huang, S.L. ; Huang, Y.T.

Author_Institution

Inst. of Electro-Opt. Eng., Nat. Sun Yat-Sen Univ., Kaohsiung, Taiwan

Volume

12

Issue

9

fYear

2000

Firstpage

1228

Lastpage

1230

Abstract

On-wafer electrooptic probing of two-dimensional electric-field vector (E-vector) is demonstrated by using one laser beam and one electrooptic prober. This technique utilizes both compressed-stretched deformation and rotational deformation on the index ellipsoid of the electrooptic crystal. Both experiment and simulation were performed to map the E-vector on a circuit board, and the measurement error is within 2.2%.

Keywords

electro-optical devices; electro-optical modulation; integrated circuit testing; measurement errors; optical polarisers; optical sensors; polarimetry; probes; 2D electric-field vector; E-vector; circuit board; compressed-stretched deformation; electrooptic crystal; index ellipsoid; measurement error; on-wafer electrooptic probing; rotational deformation; rotational deformation modulation; two-dimensional electric-field vector; Antenna measurements; Circuit testing; Crystals; Electric variables measurement; Electrooptic effects; Electrooptic modulators; Ellipsoids; Lasers and electrooptics; Optical modulation; Transmission line measurements;

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/68.874244

Filename

874244