• DocumentCode
    1395084
  • Title

    The metal-organic chemical vapor deposition growth and properties of InAsSb mid-infrared (3-6-μm) lasers and LEDs

  • Author

    Biefeld, Robert M. ; Kurtz, Steven R. ; Allerman, Andrew A.

  • Author_Institution
    Sandia Nat. Labs., Albuquerque, NM, USA
  • Volume
    3
  • Issue
    3
  • fYear
    1997
  • fDate
    6/1/1997 12:00:00 AM
  • Firstpage
    739
  • Lastpage
    748
  • Abstract
    We describe the metal-organic chemical vapor deposition (MOCVD) growth of AlAs1-xSbx cladding layers and InAsSb-InAs multiple-quantum well (MQW) and InAsSb-InAsP strained-layer superlattice (SLS) active regions for use in mid-infrared emitters. The AlAs1-xSbx cladding layers were successfully doped p- or n-type using diethylzinc or tetraethyltin, respectively. By changing the layer thickness and composition of SLSs and MQWs, we have prepared structures with low temperature (<20 K) photoluminescence wavelengths ranging from 3.2 to 6.0 μm. We have made gain-guided injection lasers using undoped p-type AlAs0.16Sb0.84 for optical confinement and both strained InAsSb-InAs MQW and InAsSb-InAsP SLS active regions. The lasers and light emitting diodes (LEDs) utilize the semi-metal properties of a GaAsSb(p)-InAs(n) heterojunction as a source for electrons injected into active regions. A multiple-stage LED utilizing this semi-metal injection scheme is reported. Gain-guided, injected lasers with a strained InAsSb-InAs MQW active region operated up to 210 K in pulsed mode with an emission wavelength of 3.8-3.9 μm and a characteristic temperature of 29-40 K. We also present results for both optically pumped and injection lasers with InAsSb-InAsP SLS active regions. The maximum operating temperature of an optically pumped 3.7-μm strained-layer superlattice (SLS) laser was 240 K. An SLS LED emitted at 4.0 μm with 80 μW of power at 300 K
  • Keywords
    III-V semiconductors; indium compounds; infrared sources; laser modes; light emitting diodes; optical pumping; photoluminescence; quantum well lasers; semiconductor superlattices; vapour phase epitaxial growth; 210 K; 29 to 40 K; 3 to 6 mum; 3.7 mum; 3.8 to 3.9 mum; 300 K; 4 mum; 80 muW; AlAs0.16Sb0.84; AlAs1-xSbx cladding layers; GaAsSb; GaAsSb(p)-InAs(n) heterojunction; InAs; InAsSb mid-infrared LEDs; InAsSb mid-infrared lasers; InAsSb-InAs; InAsSb-InAs multiple-quantum well; InAsSb-InAsP; InAsSb-InAsP strained-layer superlattice; LEDs; MOCVD; active regions; diethylzinc; gain-guided injected lasers; gain-guided injection lasers; layer thickness; low temperature photoluminescence wavelengths; metal-organic chemical vapor deposition growth; mid-infrared emitters; multiple-stage LED; optical confinement; semi-metal injection scheme; semi-metal properties; tetraethyltin; undoped p-type AlAs0.16Sb0.84; Chemical vapor deposition; Laser modes; Laser sintering; Light emitting diodes; Metallic superlattices; Optical pumping; Optical superlattices; Pump lasers; Quantum well devices; Stimulated emission;
  • fLanguage
    English
  • Journal_Title
    Selected Topics in Quantum Electronics, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    1077-260X
  • Type

    jour

  • DOI
    10.1109/2944.640629
  • Filename
    640629