• DocumentCode
    1395200
  • Title

    Critical discussion on unified 1/f noise models for MOSFETs

  • Author

    Vandamme, Ewout P. ; Vandamme, Lode K J

  • Author_Institution
    STDI-CMOS, IMEC, Leuven, Belgium
  • Volume
    47
  • Issue
    11
  • fYear
    2000
  • fDate
    11/1/2000 12:00:00 AM
  • Firstpage
    2146
  • Lastpage
    2152
  • Abstract
    Recently, unified noise models, like BSIM3, have been proposed in literature to describe the 1/f noise of n- and p-type MOSFETs in all operating regimes. These models combine carrier number fluctuations and correlated mobility fluctuations. The latter are induced by the Coulomb scattering of free carriers at trapped interface charge. The unified 1/f noise models assume implicitly that the mobility, limited by Coulomb scattering, does not depend on the inversion carrier density. However, this assumption is not correct in view of theoretical calculations and recent experimental results. In this paper, we show that the correlated mobility fluctuations are negligible, if the correct dependence on inversion carrier density is taken into account for the Coulomb scattering limited mobility. Consequently, the unified 1/f noise models cannot predict the 1/f noise observed experimentally in p-type MOSFETs, except if nonphysical fitting parameters are used. This paper serves as a critical discussion on the unified 1/f noise models for MOSFETs. Here it is not our intention to propose a new 1/f noise model
  • Keywords
    1/f noise; MOSFET; carrier density; fluctuations; semiconductor device models; semiconductor device noise; BSIM3; Coulomb scattering limited mobility; MOSFETs; carrier number fluctuations; inversion carrier density; mobility fluctuations; n-channel FETs; nonphysical fitting parameters; p-channel FETs; unified 1/f noise models; CMOS technology; Charge carrier density; Circuit noise; Fluctuations; Integrated circuit noise; Low-frequency noise; MOSFETs; Scattering; Semiconductor device modeling; Semiconductor device noise;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.877177
  • Filename
    877177