DocumentCode :
1395309
Title :
Self-Assembled Ultralow-Voltage Flexible Transparent Thin-Film Transistors Gated by \\hbox {SiO}_{2} -Based Solid Electrolyte
Author :
Jiang, Jie ; Sun, Jia ; Lu, Aixia ; Wan, Qing
Author_Institution :
Sch. of Phys. & Microelectron., Hunan Univ., Changsha, China
Volume :
58
Issue :
2
fYear :
2011
Firstpage :
547
Lastpage :
552
Abstract :
A simple self-assembling approach with only one nickel shadow mask is developed for flexible transparent thin-film transistors (TFTs) with patterned channel fabrication. An ultralow operation voltage of 1.5 V is realized due to the large specific gate capacitance (1.5 μF/cm2 ) of the microporous SiO2-based solid-electrolyte dielectric. Flexible transparent indium-tin-oxide TFTs exhibit a good performance with a low subthreshold swing of <; 70 mV/dec and a large on/off ratio of ~ 107, respectively. Such low-voltage flexible transparent TFTs with a simple self-assembling process are promising for portable flexible transparent electronics applications.
Keywords :
flexible electronics; self-assembly; silicon compounds; solid electrolytes; thin film transistors; SiO2; patterned channel fabrication; self-assembled ultralow-voltage flexible transparent thin-film transistors; solid electrolyte; Dielectrics; Electrodes; Indium tin oxide; Logic gates; Protons; Thin film transistors; $hbox{SiO}_{2}$ -based solid electrolyte; One-step self-assemble; transparent flexible thin-film transistors (TFTs); ultralow voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2010.2091451
Filename :
5658132
Link To Document :
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