• DocumentCode
    1395413
  • Title

    New developments in processing cathodic arc plasmas

  • Author

    McKenzie, David R. ; Yin, Y. ; Gerstner, Edmund G. ; Bilek, Marcela M.M.

  • Author_Institution
    Sch. of Phys., Sydney Univ., NSW, Australia
  • Volume
    25
  • Issue
    4
  • fYear
    1997
  • fDate
    8/1/1997 12:00:00 AM
  • Firstpage
    652
  • Lastpage
    659
  • Abstract
    Filtering of plasmas by curved solenoidal ducts is well established as a method of removing macroparticles. By analyzing the interactions of planar probes with the drifting plasma of the cathodic arc, new insights have been obtained into the operation of these ducts. Theoretical modeling of these interactions suggests, and experiment confirms, that the use of a separate biased electrode on the inside of the duct gives enhanced transmission without drawing excessive electron current. Theoretical modeling of a negatively biased planar electrode lying parallel to the drift velocity as well as experiment both show that ions are captured effectively onto the electrode producing a macroparticle free film at good deposition rates. The application of pulsed high voltage to the substrate placed at the exit of the duct is treated theoretically, and a model is proposed which gives a good agreement with the experimental concentration profile for a silicon surface coated and simultaneously implanted with titanium
  • Keywords
    arcs (electric); cathodes; coating techniques; elemental semiconductors; filters; ion implantation; plasma deposition; plasma probes; silicon; titanium; vacuum arcs; Si; Si surface; Ti; Ti coating; cathodic arc; cathodic arc plasmas; concentration profile; curved solenoidal ducts; deposition rate; drift velocity; drifting plasma; electron current; enhanced transmission; macroparticle free film; macroparticles; negatively biased planar electrode; planar probes; pulsed high voltage; separate biased electrode; substrate; Ducts; Electrodes; Electron mobility; Filtering; Plasma materials processing; Probes; Silicon; Substrates; Surface treatment; Voltage;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.640680
  • Filename
    640680