DocumentCode
1395413
Title
New developments in processing cathodic arc plasmas
Author
McKenzie, David R. ; Yin, Y. ; Gerstner, Edmund G. ; Bilek, Marcela M.M.
Author_Institution
Sch. of Phys., Sydney Univ., NSW, Australia
Volume
25
Issue
4
fYear
1997
fDate
8/1/1997 12:00:00 AM
Firstpage
652
Lastpage
659
Abstract
Filtering of plasmas by curved solenoidal ducts is well established as a method of removing macroparticles. By analyzing the interactions of planar probes with the drifting plasma of the cathodic arc, new insights have been obtained into the operation of these ducts. Theoretical modeling of these interactions suggests, and experiment confirms, that the use of a separate biased electrode on the inside of the duct gives enhanced transmission without drawing excessive electron current. Theoretical modeling of a negatively biased planar electrode lying parallel to the drift velocity as well as experiment both show that ions are captured effectively onto the electrode producing a macroparticle free film at good deposition rates. The application of pulsed high voltage to the substrate placed at the exit of the duct is treated theoretically, and a model is proposed which gives a good agreement with the experimental concentration profile for a silicon surface coated and simultaneously implanted with titanium
Keywords
arcs (electric); cathodes; coating techniques; elemental semiconductors; filters; ion implantation; plasma deposition; plasma probes; silicon; titanium; vacuum arcs; Si; Si surface; Ti; Ti coating; cathodic arc; cathodic arc plasmas; concentration profile; curved solenoidal ducts; deposition rate; drift velocity; drifting plasma; electron current; enhanced transmission; macroparticle free film; macroparticles; negatively biased planar electrode; planar probes; pulsed high voltage; separate biased electrode; substrate; Ducts; Electrodes; Electron mobility; Filtering; Plasma materials processing; Probes; Silicon; Substrates; Surface treatment; Voltage;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.640680
Filename
640680
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