Title :
Deposition of superhard amorphous carbon films by pulsed arc sources
Author :
Scheibe, Hans-Joachim ; Schultrich, Bernd ; Ziegele, Holger ; Siemroth, Peter
Author_Institution :
Fraunhofer-Inst. fur Werkstoff- und Strahltech., Dresden, Germany
fDate :
8/1/1997 12:00:00 AM
Abstract :
Hydrogen-free amorphous carbon films with hardness comparable to crystalline superhard materials have been deposited by special pulsed arc techniques. With the combination of very high hardness, high smoothness, and low adhesion activity to other materials which are in contact with them, these films show superior behavior in wear and slide applications. The influence of plasma and deposition conditions on these film properties and the choice of optimum conditions are discussed
Keywords :
amorphous state; carbon; hardness; plasma deposition; thin films; vacuum arcs; vacuum deposition; C; film properties; hardness; high smoothness; low adhesion activity; optimum conditions; pulsed arc sources; superhard amorphous C films deposition; Adhesives; Amorphous materials; Coatings; Crystalline materials; Crystallization; Plasma applications; Plasma materials processing; Plasma measurements; Plasma properties; Plasma temperature;
Journal_Title :
Plasma Science, IEEE Transactions on
