DocumentCode
1395446
Title
Deposition of superhard amorphous carbon films by pulsed arc sources
Author
Scheibe, Hans-Joachim ; Schultrich, Bernd ; Ziegele, Holger ; Siemroth, Peter
Author_Institution
Fraunhofer-Inst. fur Werkstoff- und Strahltech., Dresden, Germany
Volume
25
Issue
4
fYear
1997
fDate
8/1/1997 12:00:00 AM
Firstpage
685
Lastpage
688
Abstract
Hydrogen-free amorphous carbon films with hardness comparable to crystalline superhard materials have been deposited by special pulsed arc techniques. With the combination of very high hardness, high smoothness, and low adhesion activity to other materials which are in contact with them, these films show superior behavior in wear and slide applications. The influence of plasma and deposition conditions on these film properties and the choice of optimum conditions are discussed
Keywords
amorphous state; carbon; hardness; plasma deposition; thin films; vacuum arcs; vacuum deposition; C; film properties; hardness; high smoothness; low adhesion activity; optimum conditions; pulsed arc sources; superhard amorphous C films deposition; Adhesives; Amorphous materials; Coatings; Crystalline materials; Crystallization; Plasma applications; Plasma materials processing; Plasma measurements; Plasma properties; Plasma temperature;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.640686
Filename
640686
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