Title :
MOD growth of epitaxial cerium oxide buffer layer on LAO substrates for fabrication of c-axis oriented YBCO
Author :
Hosseini, Mahmood ; Abari, F.F. ; Vesaghi, M.A. ; Fardmanesh, Mehdi
Author_Institution :
Dept. of Phys., Sharif Univ. of Technol., Tehran, Iran
fDate :
10/1/2012 12:00:00 AM
Abstract :
Epitaxial cerium oxide (CeO2) buffer layer has been grown on lanthanum aluminate (LAO) single crystal substrates for fabrication of c-axis oriented YBa2Cu3O7-x (YBCO). Precursor solution of cerium acetylacetonates with viscosity of 0.6 centipoises was spin coated on the 1×1×cm area LAO substrates. The calcination was carried out by very slow ramp (1×C per minute) until the final temperature of 500×C in oxygen flow to remove most of the organic compounds. The final heat treatment has been done at 780×C by a ramp of 20× per minute in gas flow of mixed argon×oxygen with 5×Pa partial pressure of oxygen. The thickness of the deposited CeO2 buffer layer was 20 nm. Then, 100 nm thick YBCO film was deposited by sputtering on the CeO2 buffered LAO substrate. Another film with same deposition conditions was also fabricated on the bare LAO crystal for comparison. The scanning electron microscopy (SEM) and X-ray diffraction characterisations show a/b axis YBCO decreases significantly when using the CeO2 buffered LAO instead of the bare LAO. R-T and Jc measurements of the samples are also reported. Superconducting transition width of the fabricated film on the substrate with CeO2 buffer layer is less than 0.4 K and the Jc of the fabricated film is above 3.5 MA/cm2.
Keywords :
MOCVD; X-ray diffraction; barium compounds; buffer layers; calcination; cerium compounds; epitaxial growth; high-temperature superconductors; scanning electron microscopy; spin coating; sputter deposition; superconducting thin films; superconducting transitions; viscosity; yttrium compounds; CeO2; LaAlO3; SEM; X-ray diffraction; YBCO; calcination; cerium acetylacetonates; epitaxial cerium oxide buffer layer; heat treatment; lanthanum aluminate single crystal substrates; metal organic deposition; organic compounds; oxygen flow; pressure 5 Pa; scanning electron microscopy; size 100 nm; size 20 nm; spin coating; sputtering; superconducting transition; temperature 500 degC; temperature 780 degC; thick film; viscosity;
Journal_Title :
Micro & Nano Letters, IET
DOI :
10.1049/mnl.2012.0492