• DocumentCode
    1396840
  • Title

    High-current-density high-voltage normally-off AlGaN/GaN hybrid-gate HEMT with low on-resistance

  • Author

    Chen, Weijie ; Zhou, Changle ; Chen, Kevin J.

  • Author_Institution
    State Key Lab. of Electron. Thin Films & Integrated Devices, Univ. of Electron. Sci. & Technol. of China, Chengdu, China
  • Volume
    46
  • Issue
    24
  • fYear
    2010
  • Firstpage
    1626
  • Lastpage
    1627
  • Abstract
    A high-voltage normally-off AlGaN/GaN hybrid-gate HEMT (HG-HEMT) with high current-density and low on-resistance on Si substrate is fabricated. The proposed device features a hybrid-gate consisting of a short E-mode gate and a long D-mode gate. In the off-state, the short E-mode gate confirms the normally-off operation, while the D-mode gate can clamp the channel potential at a low drain voltage, which delivers high blocking capability. In the on-state, the short E-mode channel and the D-mode channel providing lower channel resistance facilitate high on-current or low on-resistance. Therefore, the HG-HEMT achieves a high breakdown voltage and low on-resistance simultaneously. Compared with the conventional device, the HG-HEMT is shown to deliver comparable breakdown voltage while featuring 62% lower on-resistance.
  • Keywords
    aluminium compounds; electric breakdown; gallium compounds; high electron mobility transistors; silicon; AlGaN-GaN; Si; high breakdown voltage; high electron mobility transistor; high-current-density high-voltage normally-off hybrid-gate HEMT; long D-mode gate; low on-resistance; short E-mode gate;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el.2010.1950
  • Filename
    5659682