Title :
High-current-density high-voltage normally-off AlGaN/GaN hybrid-gate HEMT with low on-resistance
Author :
Chen, Weijie ; Zhou, Changle ; Chen, Kevin J.
Author_Institution :
State Key Lab. of Electron. Thin Films & Integrated Devices, Univ. of Electron. Sci. & Technol. of China, Chengdu, China
Abstract :
A high-voltage normally-off AlGaN/GaN hybrid-gate HEMT (HG-HEMT) with high current-density and low on-resistance on Si substrate is fabricated. The proposed device features a hybrid-gate consisting of a short E-mode gate and a long D-mode gate. In the off-state, the short E-mode gate confirms the normally-off operation, while the D-mode gate can clamp the channel potential at a low drain voltage, which delivers high blocking capability. In the on-state, the short E-mode channel and the D-mode channel providing lower channel resistance facilitate high on-current or low on-resistance. Therefore, the HG-HEMT achieves a high breakdown voltage and low on-resistance simultaneously. Compared with the conventional device, the HG-HEMT is shown to deliver comparable breakdown voltage while featuring 62% lower on-resistance.
Keywords :
aluminium compounds; electric breakdown; gallium compounds; high electron mobility transistors; silicon; AlGaN-GaN; Si; high breakdown voltage; high electron mobility transistor; high-current-density high-voltage normally-off hybrid-gate HEMT; long D-mode gate; low on-resistance; short E-mode gate;
Journal_Title :
Electronics Letters
DOI :
10.1049/el.2010.1950