Title :
Step out of the light [Electronics lithography]
Author :
Edwards, Chris ; Sawicki, J.
Abstract :
The paper presents the different techniques in fabricating wafer process and the used of EUV lithography and it would still do a side bet on optical lithography. And to maximise the use of grating-like feature, chipmakers such as Intel and Samsung are using a technique called double patterning. Here. the exposure is performed in two stages using two different masks.
Keywords :
ultraviolet lithography; EUV lithography; double patterning; grating-like feature; optical lithography; wafer process fabrication;
Journal_Title :
Engineering & Technology
