DocumentCode :
1397974
Title :
A 2.4 Gb/s receiver and a 1:16 demultiplexer in one chip using a super self-aligned selectively grown SiGe base (SSSB) bipolar transistor
Author :
Sato, Fumihiko ; Tezuka, Hiroshi ; Soda, Masaaki ; Hashimoto, Takasuke ; Suzaki, Tetsuyuki ; Tatsumi, Tom ; Morikawa, Takenori ; Tashiro, Tsutomu
Author_Institution :
ULSI Device Dev. Lab., NEC Corp., Kanagawa, Japan
Volume :
31
Issue :
10
fYear :
1996
fDate :
10/1/1996 12:00:00 AM
Firstpage :
1451
Lastpage :
1457
Abstract :
This paper reports a 2.4 Gb/s optical terminal IC that integrates high-speed analog and digital circuits for future optical networks using 60-GHz fT self-aligned silicon-germanium (SiGe)-alloy base bipolar transistors. The selective epitaxial growth (SEG) SiGe base was formed by using cold-wall ultra-high vacuum (UHV)/CVD technology. Boron concentration reduction at the SiGe epitaxial layer/Si-substrate interface by using a new treatment prior to SEG leads to electrical characteristics with less dependence on bias voltage. The IC consists of a receiver (a preamplifier, an automatic gain control (AGC) amplifier, a phase-locked loop (PLL), and a D-type flip-flop (D-F/F)), and a 1:16 demultiplexer (DMUX). An input offset control circuit is included in the AGC amplifier for wide dynamic range. Trench isolation and silicon-on-insulator (SOI) technologies are introduced to reduce crosstalk between the amplifiers and the PLL. Power consumptions are 0.6 W at -5.2 V for the analog part and 0.45 W at -3.3 V for the digital part, which does not include the ECL output buffers
Keywords :
Ge-Si alloys; bipolar integrated circuits; demultiplexing equipment; isolation technology; mixed analogue-digital integrated circuits; optical fibre networks; optical receivers; semiconductor epitaxial layers; semiconductor growth; semiconductor materials; silicon-on-insulator; vapour phase epitaxial growth; -3.3 V; -5.2 V; 0.45 W; 0.6 W; 2.4 Gbit/s; 60 GHz; SOI technologies; Si; SiGe-Si; WANs; cold-wall ultra-high vacuum/CVD technology; dynamic range; input offset control circuit; optical LANs; optical networks; optical terminal IC; receiver/demultiplexer chip; selective epitaxial growth; super self-aligned selectively grown base; trench isolation; Germanium silicon alloys; High speed optical techniques; Integrated optics; Optical amplifiers; Optical buffering; Optical fiber networks; Optical receivers; Phase locked loops; Silicon germanium; Silicon on insulator technology;
fLanguage :
English
Journal_Title :
Solid-State Circuits, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9200
Type :
jour
DOI :
10.1109/4.540055
Filename :
540055
Link To Document :
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