• DocumentCode
    1398130
  • Title

    Split-Frame Gimbaled Two-Dimensional MEMS Scanner for Miniature Dual-Axis Confocal Microendoscopes Fabricated by Front-Side Processing

  • Author

    Jeong, Jae-Woong ; Kim, Sunwoo ; Solgaard, Olav

  • Author_Institution
    Stanford Univ., Stanford, CA, USA
  • Volume
    21
  • Issue
    2
  • fYear
    2012
  • fDate
    4/1/2012 12:00:00 AM
  • Firstpage
    308
  • Lastpage
    315
  • Abstract
    In this paper, we introduce a 2-D microelectromechanical systems scanner for 3.2-mm-diameter dual-axis confocal microendoscopes, fabricated exclusively by front-side processing. Compared to conventional bulk micromachining that incorporates back-side etching, the front-side process is simple and thus enables high device yield. By eliminating the back-side etch window, the process yields compact and robust structures that facilitate handling and packaging. An important component of our front- side fabrication is a low-power deep reactive ion etching (DRIE) process that avoids the heating problems associated with standard DRIE. Reducing the RF etch coil power from 2400 to 1500 W leads to elimination of the spring disconnection problem caused by heat-induced aggressive local etching. In our scanner, the outer frame of the gimbal is split and noncontinuous to allow the scanner to be diced along the very edge of the scanning mirror in order to minimize the chip size (1.8 mm × 1.8 mm). The maximum optical deflection angles in static mode are ±5.5° and ±3.8° for the outer and inner axes, respectively. In dynamic operation, the optical deflection angles are ±11.8° at 1.18 kHz for the outer axis and ±8.8° at 2.76 kHz for the inner axis.
  • Keywords
    endoscopes; micromachining; micromechanical devices; micromirrors; optical scanners; sputter etching; 2D microelectromechanical system; DRIE process; RF etch coil power; back-side etch window; bulk micromachining; chip size; frequency 2.76 kHz; front- side fabrication; front-side processing; handling; heat-induced aggressive local etching; high device yield; low-power deep reactive ion etching; maximum optical deflection angle; miniature dual-axis confocal microendoscope; packaging; power 1500 W; scanning mirror; size 3.2 mm; split-frame gimbaled two-dimensional MEMS scanner; spring disconnection problem; static mode; Etching; Heating; Micromechanical devices; Microscopy; Mirrors; Silicon; Springs; 2-D microelectromechanical systems (MEMS) scanner; Dual-axis confocal (DAC) microscopy; front-side processing; low-power deep reactive ion etching (DRIE); microendoscope; micromirror; self-alignment; split-frame gimbal; vertical combdrive actuator;
  • fLanguage
    English
  • Journal_Title
    Microelectromechanical Systems, Journal of
  • Publisher
    ieee
  • ISSN
    1057-7157
  • Type

    jour

  • DOI
    10.1109/JMEMS.2011.2175368
  • Filename
    6104088