• DocumentCode
    1398625
  • Title

    Dislocation planes in semiconductors

  • Author

    Matar¿¿, H.F.

  • Author_Institution
    Sÿddeutsche Telefon-Apparete-Kabel- und Drahtwerke A.G., Nÿrnberg, West Germany
  • Volume
    106
  • Issue
    15
  • fYear
    1959
  • fDate
    5/1/1959 12:00:00 AM
  • Firstpage
    293
  • Lastpage
    302
  • Abstract
    Dislocations and mainly dislocation planes as the most important non-chemical imperfections in semiconductor crystals are discussed from the aspect of their influence on carrier transport. After a short review of the general properties of grain-boundary planes of medium angle of misfit, the electrical effects are discussed, including the barrier behaviour, the band structure and lifetime anisotropy. Device structures based on these properties of dislocation planes are described, among which the dislocation-field-effect transistor shows promising features as the first temperature-independent transistor in the range 300¿2°K.
  • Keywords
    semiconductors; transistors;
  • fLanguage
    English
  • Journal_Title
    Proceedings of the IEE - Part B: Electronic and Communication Engineering
  • Publisher
    iet
  • ISSN
    0369-8890
  • Type

    jour

  • DOI
    10.1049/pi-b-2.1959.0072
  • Filename
    5244234