DocumentCode
1398625
Title
Dislocation planes in semiconductors
Author
Matar¿¿, H.F.
Author_Institution
Sÿddeutsche Telefon-Apparete-Kabel- und Drahtwerke A.G., Nÿrnberg, West Germany
Volume
106
Issue
15
fYear
1959
fDate
5/1/1959 12:00:00 AM
Firstpage
293
Lastpage
302
Abstract
Dislocations and mainly dislocation planes as the most important non-chemical imperfections in semiconductor crystals are discussed from the aspect of their influence on carrier transport. After a short review of the general properties of grain-boundary planes of medium angle of misfit, the electrical effects are discussed, including the barrier behaviour, the band structure and lifetime anisotropy. Device structures based on these properties of dislocation planes are described, among which the dislocation-field-effect transistor shows promising features as the first temperature-independent transistor in the range 300¿2°K.
Keywords
semiconductors; transistors;
fLanguage
English
Journal_Title
Proceedings of the IEE - Part B: Electronic and Communication Engineering
Publisher
iet
ISSN
0369-8890
Type
jour
DOI
10.1049/pi-b-2.1959.0072
Filename
5244234
Link To Document