DocumentCode :
1398625
Title :
Dislocation planes in semiconductors
Author :
Matar¿¿, H.F.
Author_Institution :
Sÿddeutsche Telefon-Apparete-Kabel- und Drahtwerke A.G., Nÿrnberg, West Germany
Volume :
106
Issue :
15
fYear :
1959
fDate :
5/1/1959 12:00:00 AM
Firstpage :
293
Lastpage :
302
Abstract :
Dislocations and mainly dislocation planes as the most important non-chemical imperfections in semiconductor crystals are discussed from the aspect of their influence on carrier transport. After a short review of the general properties of grain-boundary planes of medium angle of misfit, the electrical effects are discussed, including the barrier behaviour, the band structure and lifetime anisotropy. Device structures based on these properties of dislocation planes are described, among which the dislocation-field-effect transistor shows promising features as the first temperature-independent transistor in the range 300¿2°K.
Keywords :
semiconductors; transistors;
fLanguage :
English
Journal_Title :
Proceedings of the IEE - Part B: Electronic and Communication Engineering
Publisher :
iet
ISSN :
0369-8890
Type :
jour
DOI :
10.1049/pi-b-2.1959.0072
Filename :
5244234
Link To Document :
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