DocumentCode
1398650
Title
Submicrometer-Thick Low-Loss As 
S 
Planar Waveguides for Nonlinear Optical Devices
Author
Choi, D.-Y. ; Madden, S. ; Bulla, D.A. ; Wang, R. ; Rode, A. ; Luther-Davies, B.
Author_Institution
Centre for Ultrahigh-Bandwidth Devices for Opt. Syst. (CUDOS), Australian Nat. Univ., Canberra, ACT, Australia
Volume
22
Issue
7
fYear
2010
fDate
4/1/2010 12:00:00 AM
Firstpage
495
Lastpage
497
Abstract
We describe a fabrication process for and the characterization of submicrometer-thick As2S3 waveguides. Poly(methylmethacrylate) and bottom antireflective coating were employed as thin protective layers prior to photoresist patterning in order to prevent the attack of the As2S3 film by an alkaline developer. Propagation losses of ~0.2 and 0.6 dB/cm were measured for 4- and 2-??m-wide waveguides fabricated from 0.85-??m-thick films. Slightly higher loss in the transverse-magnetic mode may be the result of surface scattering of the rougher etched sidewalls.
Keywords
antireflection coatings; arsenic compounds; chalcogenide glasses; nonlinear optics; optical fabrication; optical films; optical losses; optical planar waveguides; photoresists; surface scattering; As2S3; alkaline developer; bottom antireflective coating; nonlinear optical devices; photoresist patterning; poly(methylmethacrylate); propagation loss; size 0.85 mum; submicrometer-thick low-loss planar waveguides; surface scattering; thin protective layers; transverse-magnetic mode; waveguide fabrication; Amorphous semiconductors; fabrication; nonlinear optic devices; optical waveguides;
fLanguage
English
Journal_Title
Photonics Technology Letters, IEEE
Publisher
ieee
ISSN
1041-1135
Type
jour
DOI
10.1109/LPT.2010.2040170
Filename
5401068
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