DocumentCode
1399614
Title
The electrical characteristics of bulk unipolar camel diodes in pre-amorphized silicon
Author
Goldsmith, B.J. ; Brotherton, Stan D.
Author_Institution
Philips Res. Lab., Redhill, UK
Volume
37
Issue
4
fYear
1990
fDate
4/1/1990 12:00:00 AM
Firstpage
1074
Lastpage
1080
Abstract
Barrier heights derived from the measured forward I -V characteristics are consistent with barrier heights calculated using doping profiles determined by secondary ion mass spectroscopy (SIMS). Reverse-bias I -V characteristics show excessive barrier pull-down, which is explained by the presence of excess donors at the original amorphous-single-crystal interface. The existence of these donors has been confirmed by C -V profiling. A reduction in excess donor density by plasma hydrogenation has led to a corresponding reduction in the reverse-bias barrier pull-down. These camel diodes have reverse-bias characteristics superior to those of diodes fabricated in single-crystal silicon
Keywords
amorphous semiconductors; doping profiles; elemental semiconductors; hydrogen; secondary ion mass spectra; semiconductor diodes; silicon; C-V profiling; Si:H; barrier heights; barrier pull-down; bulk unipolar camel diodes; doping profiles; electrical characteristics; excess donor density; forward I-V characteristics; plasma hydrogenation; preamorphized Si; reverse bias I-V characteristics; secondary ion mass spectroscopy; Capacitance-voltage characteristics; Doping profiles; Electric variables; Gaussian distribution; Impurities; Light emitting diodes; Plasma density; Plasma immersion ion implantation; Plasma properties; Silicon;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.52444
Filename
52444
Link To Document