• DocumentCode
    1399614
  • Title

    The electrical characteristics of bulk unipolar camel diodes in pre-amorphized silicon

  • Author

    Goldsmith, B.J. ; Brotherton, Stan D.

  • Author_Institution
    Philips Res. Lab., Redhill, UK
  • Volume
    37
  • Issue
    4
  • fYear
    1990
  • fDate
    4/1/1990 12:00:00 AM
  • Firstpage
    1074
  • Lastpage
    1080
  • Abstract
    Barrier heights derived from the measured forward I-V characteristics are consistent with barrier heights calculated using doping profiles determined by secondary ion mass spectroscopy (SIMS). Reverse-bias I-V characteristics show excessive barrier pull-down, which is explained by the presence of excess donors at the original amorphous-single-crystal interface. The existence of these donors has been confirmed by C-V profiling. A reduction in excess donor density by plasma hydrogenation has led to a corresponding reduction in the reverse-bias barrier pull-down. These camel diodes have reverse-bias characteristics superior to those of diodes fabricated in single-crystal silicon
  • Keywords
    amorphous semiconductors; doping profiles; elemental semiconductors; hydrogen; secondary ion mass spectra; semiconductor diodes; silicon; C-V profiling; Si:H; barrier heights; barrier pull-down; bulk unipolar camel diodes; doping profiles; electrical characteristics; excess donor density; forward I-V characteristics; plasma hydrogenation; preamorphized Si; reverse bias I-V characteristics; secondary ion mass spectroscopy; Capacitance-voltage characteristics; Doping profiles; Electric variables; Gaussian distribution; Impurities; Light emitting diodes; Plasma density; Plasma immersion ion implantation; Plasma properties; Silicon;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.52444
  • Filename
    52444