• DocumentCode
    1400018
  • Title

    A 30-GHz fT quasi-self-aligned single-poly bipolar technology

  • Author

    De Pontcharra, Jean ; Behouche, Evelyne ; Ailloud, Laurence ; Thomas, Danielle ; Vendrame, Loris ; Gravier, Thierry ; Chantre, Alain

  • Author_Institution
    CEA, Centre d´´Etudes Nucleaires de Grenoble, France
  • Volume
    44
  • Issue
    11
  • fYear
    1997
  • fDate
    11/1/1997 12:00:00 AM
  • Firstpage
    2091
  • Lastpage
    2097
  • Abstract
    In this paper, we report the state-of-the-art results obtained in quasi-self-aligned (QSA) single polysilicon NPN bipolar transistors fabricated within a low-complexity 0.5-μm CMOS process. Our devices demonstrate nearly ideal static characteristics and very good frequency performance. In fact, the obtained 30-GHz maximum fT and 4.1 V breakdown voltage are comparable to the best reported results for single-poly self-aligned (SA) transistors. Some details of the technological process as well as statistical measurements performed on the different optimization splits are presented. The fT and f max on-wafer high-frequency measurements are discussed in terms of reproducibility, sensitivity to process parameters, and device geometry
  • Keywords
    BiCMOS integrated circuits; characteristics measurement; elemental semiconductors; ion implantation; microwave bipolar transistors; silicon; 0.5 mum; 30 GHz; 4.1 V; BiCMOS technology; breakdown voltage; cutoff frequency; device geometry; frequency performance; low-complexity CMOS process; maximum frequency of oscillation; nearly ideal static characteristics; on-wafer high-frequency measurements; optimization splits; process parameter sensitivity; quasi-self-aligned single polysilicon NPN bipolar transistors; reproducibility; small signal current gain; statistical measurements; technological process; Bipolar transistors; CMOS process; CMOS technology; Dry etching; Frequency; Implants; Performance evaluation; Protection; Reproducibility of results; Resists;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.641389
  • Filename
    641389