DocumentCode :
1400190
Title :
Experimental transient analysis of the tunnel current in EEPROM cells
Author :
Bez, Roberto ; Cantarelli, Daniele ; Cappelletti, Paolo
Author_Institution :
SGS-Thomson Microelectron., Milan, Italy
Volume :
37
Issue :
4
fYear :
1990
fDate :
4/1/1990 12:00:00 AM
Firstpage :
1081
Lastpage :
1086
Abstract :
Since the cell is written with a ramp waveform pulse in order to minimize the maximum tunnel current in actual device operation, the measurements were performed with ramp waveform writing pulses at different ramp speeds. The kind of information obtained from the transient analysis greatly improves the understanding of the device physics. By measuring tunnel current, some expected results, such as the dependence of the maximum current value on the ramp speed, were observed. Some unexpected results, such as an anomalous peak during the erasing operation and the influence of the ramp speed on the conduction properties of the thin oxide, which is shown by the Fowler-Nordheim plot of the experimental tunnel current, were also observed
Keywords :
EPROM; transients; tunnelling; EEPROM cells; Fowler-Nordheim plot; conduction properties; erasing operation; maximum current; ramp speeds; ramp waveform writing pulses; thin oxide; transient analysis; tunnel current; Capacitance; Character generation; EPROM; Electrons; Equations; Equivalent circuits; MOSFETs; Nonvolatile memory; Transient analysis; Writing;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.52445
Filename :
52445
Link To Document :
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