DocumentCode
1400643
Title
The new two-dimensional electron gas base HBT (2DEG-HBT): two-dimensional numerical simulation
Author
Rabinzohn, Patrick D. ; Usagawa, Toshiyuki ; Mizuta, Hiroshi ; Yamaguchi, Ken
Author_Institution
Philips Res. Organ., Limeil-Brevannes, France
Volume
38
Issue
2
fYear
1991
fDate
2/1/1991 12:00:00 AM
Firstpage
222
Lastpage
231
Abstract
The bipolar/FET characteristics of the 2DEG-HBT are analyzed extensively by a two-dimensional numerical simulator based on a drift-diffusion model. For bipolar operations at high collector current densities, it is confirmed that the cutoff frequency f T is determined mainly by the collector transit time of holes and by the charging time of the extrinsic base-collector capacitance C bcEXT. The charging times of the emitter and base regions and the base transit time are shown to be negligible. A high cutoff frequency F T (88 GHz) and current gain h FE (760) are obtained for an emitter size of 1×10 μm2, and undoped collector thickness of 150 nm, and a collector current density J c of 105 A/cm2. The FET operation of the same 2DEG-HBT structure shows a threshold voltage V th of 0.74 V, the transconductance G mmax of 80 mS/mm, and maximum cutoff frequency F Tmax of 15 GHz. The dependence of the device performance on material parameters is analyzed extensively from a device design point of view
Keywords
III-V semiconductors; aluminium compounds; gallium arsenide; heterojunction bipolar transistors; numerical methods; semiconductor device models; solid-state microwave devices; 0.74 V; 110 GHz; 15 GHz; 150 nm; 163 GHz; 2DEG-HBT structure; 80 mS; 88 GHz; AlGaAs-GaAs heterojunction bipolar transistor; FET operation; bipolar/FET characteristics; charging time; collector current densities; collector transit time; cutoff frequency; drift-diffusion model; epitaxial layer structure optimisation; material parameters; numerical simulation; threshold voltage; transconductance; two-dimensional electron gas base HBT; two-dimensional numerical simulator; undoped collector thickness; Analytical models; Capacitance; Current density; Cutoff frequency; Electrons; FETs; Heterojunction bipolar transistors; Iron; Numerical simulation; Threshold voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.69898
Filename
69898
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