DocumentCode :
1400828
Title :
High Current-Gain Implantation-Free 4H-SiC Monolithic Darlington Transistor
Author :
Ghandi, Reza ; Buono, Benedetto ; Domeij, Martin ; östling, Mikael
Author_Institution :
KTH R. Inst. of Technol., Kista, Sweden
Volume :
32
Issue :
2
fYear :
2011
Firstpage :
188
Lastpage :
190
Abstract :
An implantation-free 4H-SiC Darlington transistor with high current gain of 2900 (JC = 970 A/cm2 and VCE = 6 V) at room temperature is reported. The device demonstrates a record maximum current gain of 640 at 200°C, offering an attractive solution for high-temperature applications. The monolithic Darlington device exhibits an open-base breakdown voltage of 1 kV that is less than the optimum bulk breakdown due to isolation trench between the driver and the output bipolar junction transistor. On the same wafer, a monolithic Darlington pair with a nonisolated base layer was also fabricated. At room temperature, this device shows a maximum current gain of 1000 and an open-base breakdown voltage of 2.8 kV, which is 75% of the parallel-plane breakdown voltage.
Keywords :
bipolar transistors; high-temperature electronics; isolation technology; silicon compounds; wide band gap semiconductors; SiC; high current-gain implantation-free monolithic Darlington transistor; high-temperature applications; isolation trench; open-base breakdown voltage; output bipolar junction transistor; temperature 200 degC; voltage 1 kV; voltage 2.8 kV; 4H-SiC; Darlington transistor;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2010.2090646
Filename :
5664756
Link To Document :
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