DocumentCode :
1401429
Title :
Stress-induced parametric shift in plastic packaged devices
Author :
Ali, Hassan
Author_Institution :
Digital Semicond., Hudson, MA, USA
Volume :
20
Issue :
4
fYear :
1997
fDate :
11/1/1997 12:00:00 AM
Firstpage :
458
Lastpage :
462
Abstract :
In order to determine the shift in device characteristics due to stresses the die experiences during assembly, long channel NMOS and PMOS transistors (6.25×6.25 μm) were encapsulated in plastic quad flat packages (PQFPs) and the shifts in device parameters were monitored. Shifts as much as -5.3% in drain current (Idsat) were recorded for the NMOS devices, and +1.64% for PMOS devices. These shifts indicate a biaxial compressive stress level of some 60-87 MPa after plastic packaging. Die attach alone (prior to plastic encapsulation) results in a biaxial tensile stress in the range 35-55 MPa. Different mold compounds can exert different stress levels and accompanying device parameter shifts. Prolonged high temperature storage, leading to resin shrinkage, also affects device characteristics. Short channel submicron devices, typical of what is used in products, are expected to show little shift. Monitoring device parameter shift is a simple technique and is well suited for quantifying the stresses the die experiences in a plastic package
Keywords :
MOSFET; encapsulation; microassembling; plastic packaging; semiconductor device packaging; stress analysis; 6.25 micron; biaxial compressive stress level; device parameter shifts; device parameters; die attach; drain current; encapsulation; high temperature storage; long channel MOS transistors; plastic quad flat packages; resin shrinkage; short channel submicron devices; stress-induced parametric shift; Assembly; Compressive stress; Condition monitoring; Encapsulation; MOS devices; MOSFETs; Microassembly; Plastic packaging; Temperature; Tensile stress;
fLanguage :
English
Journal_Title :
Components, Packaging, and Manufacturing Technology, Part B: Advanced Packaging, IEEE Transactions on
Publisher :
ieee
ISSN :
1070-9894
Type :
jour
DOI :
10.1109/96.641515
Filename :
641515
Link To Document :
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