DocumentCode
1401692
Title
Power deposited on a dielectric by multipactor
Author
Ang, Lay-Kee ; Lau, Y.Y. ; Kishek, Rami A. ; Gilgenbach, Ronald M.
Author_Institution
Dept. of Nucl. Eng. & Radiol. Sci., Michigan Univ., Ann Arbor, MI, USA
Volume
26
Issue
3
fYear
1998
fDate
6/1/1998 12:00:00 AM
Firstpage
290
Lastpage
295
Abstract
We use a simple transmission line model to evaluate the RF power deposited on a dielectric window by a multipactor discharge. The calculation employs Monte Carlo simulation, using realistic secondary electron yield curves as input, and taking into account the distributions in the emission velocities and emission angles of the secondary electrons. Beam loading on the external RF, as well as the evolution of the DC electric field due to dielectric charging, are also accounted for. It is found that the buildup of the multipactor space charge, rather than beam loading, causes saturation. Over a wide range of operating conditions and materials, it is found quite generally that the multipactor delivers on the order of 1 percent, or less, of the RF power to the dielectric. A simple estimate is given in support of this ratio, using the susceptibility diagram that was constructed from kinematic considerations. Comparison with experimental results is given
Keywords
Monte Carlo methods; high-frequency discharges; microwave generation; microwave tubes; secondary electron emission; space charge; surface discharges; DC electric field; Monte Carlo simulation; RF power; beam loading; dielectric charging; dielectric window; emission angles; emission velocities; kinematic considerations; multipactor; multipactor discharge; multipactor space charge; operating condition; saturation; secondary electron yield curves; secondary electrons; susceptibility diagram; transmission line model; Dielectric losses; Dielectric materials; Electromagnetic heating; Electron beams; Electron emission; Microwave devices; Power transmission lines; Space charge; Thermal stresses; Transmission line theory;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.700756
Filename
700756
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