Title :
Study on Hydrogen Ion-Implanted Characteristic of Thin-Film Green Resonant-Cavity Light-Emitting Diodes
Author :
Huang, Shih-Yung ; Horng, Ray-Hua ; Tseng, Po-Han ; Tu, Jen-Hung ; Tu, Li-Wei ; Wuu, Dong-Sing
Author_Institution :
Dept. of Mater. Sci. & Eng., Nat. Chung Hsing Univ., Taichung, Taiwan
fDate :
3/15/2010 12:00:00 AM
Abstract :
This letter investigates the effects of hydrogen ion implantation on the characteristics of InGaN-based green resonant-cavity light-emitting diodes (RCLEDs). RCLEDs with ion implantation were fabricated by implanting hydrogen ion (H+) in a selective area. The implanted region was used to form current-confinement layers due to an existing deep-level ( ~ 512 nm, 2.4 eV). Superior directionality was also obtained because the selective area of p-GaN layer of RCLEDs with ion implantation provided a low refractive index. The light emission enhancement was due to the high current density increasing and the total reflection of the emission ray. The electroluminescence spectrum exhibited narrow full-width at half-maximum of 45 nm for the RCLEDs with ion implantation. The fiber-coupled power of RCLEDs with H+ implantation was 2.2 times greater than that of a similar structure without H+ implantation at an injection current of 20 mA.
Keywords :
III-V semiconductors; electroluminescence; gallium compounds; indium compounds; ion implantation; light emitting diodes; optical resonators; refractive index; wide band gap semiconductors; InGaN; current 20 mA; current-confinement layers; electroluminescence spectrum; hydrogen ion-implantation; light emission enhancement; refractive index; thin-film green resonant-cavity light-emitting diodes; Hydrogen–ion implantation; InGaN; resonant-cavity light-emitting diode (RCLED);
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2010.2040777