DocumentCode :
1401954
Title :
Leaky Modes Analysis in Very Deeply Etched Semiconductor Ridge Waveguides
Author :
Lu, Qiaoyin ; Guo, Wei-Hua ; Byrne, Diarmuid ; Donegan, John F.
Author_Institution :
Semicond. Photonics Group, Trinity Coll. Dublin, Dublin, Ireland
Volume :
22
Issue :
6
fYear :
2010
fDate :
3/15/2010 12:00:00 AM
Firstpage :
407
Lastpage :
409
Abstract :
Leaky modes in very deeply etched semiconductor ridge waveguides have been analyzed by the compact 2-D finite-difference time-domain method combined with the uniaxial anisotropic perfectly matched layer absorption boundary condition and the Pade?? approximation transform technique. Results show that instead of continuously dropping, the loss of these leaky modes tends to saturate when the etching depth under the waveguide core is very deep. Mode coupling between these leaky modes and the modes in the lower cladding slab waveguide has been used to explain this saturation behavior. It is also found that transverse-electric TE20 modes can have a lower loss than TE10 modes at specific ridge width in such deep ridge waveguides.
Keywords :
approximation theory; finite difference time-domain analysis; ridge waveguides; 2D finite-difference time-domain method; Pade approximation transform technique; leaky modes analysis; lower cladding slab waveguide; semiconductor ridge waveguides; uniaxial anisotropic perfectly matched layer absorption boundary condition; Compact 2-D finite-difference time-domain (FDTD) method; Padé approximation transform (PAT); deep ridge waveguides; high-order leaky modes; uniaxial perfectly matched layer (PML);
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/LPT.2010.2040823
Filename :
5404955
Link To Document :
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