• DocumentCode
    1402170
  • Title

    Virtual cathode formation due to electromagnetic transients

  • Author

    Luginsland, John W. ; McGee, Sarah ; Lau, Y.Y.

  • Author_Institution
    Dept. of Nucl. Eng., Michigan Univ., Ann Arbor, MI, USA
  • Volume
    26
  • Issue
    3
  • fYear
    1998
  • fDate
    6/1/1998 12:00:00 AM
  • Firstpage
    901
  • Lastpage
    904
  • Abstract
    The process of virtual cathode formation in a gap is critically examined via particle simulations. It is found that the limiting current obtained from the electrostatic approximation is valid only in the deeply nonrelativistic regime. For injection energy as low as 30 keV, the transients in the injected current may produce an inductive voltage that can significantly lower the limiting current from the classical, electrostatic value. Although the source of the virtual cathode is transient in nature, the virtual cathode formed due to this inductive voltage persists long after the injected current has reached a steady-state value. The self-magnetic field is unimportant, however, at this low energy. This result has implications for scaling devices with rapid current rise times to weakly nonrelativistic energies as well as for Particle-In-Cell (PIC) codes which use field emission models with electric field thresholds
  • Keywords
    cathodes; microwave tubes; space-charge limited devices; space-charge-limited conduction; 30 keV; classical electrostatic value; current rise times; deeply nonrelativistic regime; electric field thresholds; electromagnetic transients; electrostatic approximation; field emission models; inductive voltage; injected current; injection energy; limiting current; particle simulations; particle-in-cell codes; scaling devices; self-magnetic field; steady-state value; transient source; virtual cathode formation; weakly nonrelativistic energies; Cathodes; Current density; Electromagnetic fields; Electromagnetic forces; Electrons; Electrostatics; Helium; Space charge; Steady-state; Voltage;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.700866
  • Filename
    700866