DocumentCode
1402732
Title
Carrier Lifetime Engineering for Floating-Body Cell Memory
Author
Kim, Sungho ; Choi, Sung-Jin ; Moon, Dong-Il ; Choi, Yang-Kyu
Author_Institution
Dept. of Electr. Eng., Korea Adv. Inst. of Sci. & Technol., Daejeon, South Korea
Volume
59
Issue
2
fYear
2012
Firstpage
367
Lastpage
373
Abstract
A novel bias scheme is demonstrated for performance improvement of floating-body cell memory, particularly retention time. Its basic mechanism is based on carrier lifetime engineering, which takes advantage of generation lifetime that is longer than recombination lifetime. In addition, the proposed scheme is suitable for low-power operation; a high drain bias is unnecessary to generate excess carriers, which allows reliable endurance of up to 1012 switching instances at 85 °C.
Keywords
DRAM chips; carrier lifetime; silicon-on-insulator; carrier lifetime engineering; floating body cell memory; generation lifetime; high drain bias; low power operation; performance improvement; Charge carrier lifetime; Logic gates; Materials; Reliability; Sensors; Steady-state; Time measurement; 1T-DRAM; Carrier lifetime; double gate; finFET; floating-body cell (FBC); silicon-on-insulator (SOI) metal–oxide–semiconductor field-effect transistor (MOSFET);
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2011.2176944
Filename
6108357
Link To Document