DocumentCode :
1403309
Title :
Comprehensive Study on the Bias-Dependent Equivalent-Circuit Elements Affected by PECVD SiN Passivation in AlGaN/GaN HEMTs
Author :
Liu, Zhi Hong ; Ng, Geok Ing ; Arulkumaran, Subramaniam ; Maung, Ye Kyaw Thu ; Teo, Khoon Leng ; Foo, Siew Chuen ; Sahmuganathan, Vicknesh
Author_Institution :
Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore, Singapore
Volume :
58
Issue :
2
fYear :
2011
Firstpage :
473
Lastpage :
479
Abstract :
In this paper, a comprehensive study on the effect of plasma-enhanced chemical-vapor-deposited SiN surface passivation on the bias-dependent small-signal equivalent-circuit elements is carried out for AlGaN/GaN high-electron mobility transistors on a high-resistivity silicon substrate. The direct-current and small-signal performance of the device was found to be improved by surface passivation. The small-signal equivalent-circuit parameters at various gate and drain biases were extracted, and the physical mechanisms of their bias-dependent behaviors before and after passivation are discussed in detail.
Keywords :
III-V semiconductors; aluminium compounds; elemental semiconductors; equivalent circuits; gallium compounds; high electron mobility transistors; passivation; plasma CVD; silicon; silicon compounds; wide band gap semiconductors; AlGaN-GaN; HEMT; PECVD; Si; SiN; bias-dependent equivalent-circuit elements; high electron mobility transistors; high-resistivity silicon substrate; plasma enhanced chemical vapor deposition; surface passivation; Aluminum gallium nitride; Gallium nitride; HEMTs; Logic gates; MODFETs; Passivation; Silicon compounds; Equivalent-circuit parameters (ECPs); GaN; high-electron mobility transistor (HEMT); passivation;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2010.2093144
Filename :
5667054
Link To Document :
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