• DocumentCode
    1403855
  • Title

    Properties of Metal–Graphene Contacts

  • Author

    Knoch, Joachim ; Chen, Zhihong ; Appenzeller, Joerg

  • Author_Institution
    Inst. of Semicond. Electron., RWTH Aachen Univ., Aachen, Germany
  • Volume
    11
  • Issue
    3
  • fYear
    2012
  • fDate
    5/1/2012 12:00:00 AM
  • Firstpage
    513
  • Lastpage
    519
  • Abstract
    We present a study on the metal-graphene contact properties. Utilizing a dual-gate field-effect transistor device, an energetic separation between the Fermi level and the Dirac point in the contact areas can be adjusted deliberately by applying an appropriate front-gate voltage that acts only on the channel. This front-gate voltage is compensated by an opposite large-area back-gate voltage, thereby mimicking the metal induced doping effect. A back-gate voltage sweep enables identifying two distinct resistance peaks-a result of the combined impact of the graphene cones in the contact and in the channel region. Comparing our experimental data with simulations allows extracting the coupling strength between metal and graphene and also estimating the magnitude of the metal-induced doping concentration in the case of palladium contacts. In contrast to conventional metal-semiconductor contacts, our simulations predict a decreased on-current for increased coupling strength in graphene field-effect transistors.
  • Keywords
    Fermi level; doping profiles; field effect transistors; graphene; metal-insulator boundaries; palladium; Dirac point; Fermi level; Pd-C; contact areas; conventional metal-semiconductor contacts; coupling strength; dual-gate field-effect transistor device; energetic separation; graphene cones; graphene field-effect transistors; large-area back gate voltage; metal-graphene contact properties; metal-induced doping concentration; palladium contacts; resistance peaks; Contacts; Couplings; Doping; Immune system; Logic gates; Metals; Resistance; Contacts; graphene; graphene field-effect transistor (GFET); metal–graphene coupling;
  • fLanguage
    English
  • Journal_Title
    Nanotechnology, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1536-125X
  • Type

    jour

  • DOI
    10.1109/TNANO.2011.2178611
  • Filename
    6109352