Title :
Long-wavelength strained quantum-well lasers oscillating up to 210/spl deg/C on InGaAs ternary substrates
Author :
Otsubo, K. ; Shoji, J. ; Kusunoki, T. ; Suzuki, T. ; Uchida, T. ; Nishijima, Y. ; Nakajima, Kensuke ; Ishikawa, H.
Author_Institution :
RWCP Opt. Interconnection Fujitsu Lab., Kanagawa, Japan
Abstract :
Long-wavelength InGaAs-InAlGaAs strained quantum-well lasers have been fabricated on In/sub 0.22/Ga/sub 0.78/As ternary substrates grown by the Bridgman method. The threshold current density and lasing wavelength at 20/spl deg/C are 245 A/cm2 and 1.226 μm, respectively. The device has lased up to 210/spl deg/C, which is the highest operating temperature ever reported for long-wavelength semiconductor lasers. The temperature sensitivity of the slope efficiency between 20/spl deg/C and 120/spl deg/C is only -0.0051 dB/K, showing suppressed carrier overflow owing to deep potential quantum wells. These high-temperature durabilities of this laser are fascinating features for application to optical subscriber and optical interconnection systems.
Keywords :
III-V semiconductors; crystal growth from melt; current density; gallium arsenide; indium compounds; infrared sources; laser transitions; optical fabrication; optical transmitters; quantum well lasers; substrates; 1.226 mum; 120 C; 20 C; 210 C; Bridgman method; In/sub 0.22/Ga/sub 0.78/As; In/sub 0.22/Ga/sub 0.78/As ternary substrates; InGaAs ternary substrates; InGaAs-InAlGaAs; InGaAs-InAlGaAs strained quantum-well lasers; deep potential quantum wells; high-temperature durabilities; highest operating temperature; lasing wavelength; long-wavelength semiconductor lasers; long-wavelength strained quantum-well lasers; optical interconnection systems; optical subscriber systems; slope efficiency; temperature sensitivity o; threshold current density; Indium gallium arsenide; Laser theory; Optical device fabrication; Optical interconnections; Optical sensors; Quantum well lasers; Semiconductor lasers; Substrates; Temperature sensors; Threshold current;
Journal_Title :
Photonics Technology Letters, IEEE