DocumentCode :
1408234
Title :
Dynamic behavior and instability of field emitter surfaces
Author :
Tsong, Tien T.
Author_Institution :
Dept. of Phys., Pennsylvania State Univ., University Park, PA, USA
Volume :
38
Issue :
10
fYear :
1991
fDate :
10/1/1991 12:00:00 AM
Firstpage :
2317
Lastpage :
2319
Abstract :
The instability of field emission current arises from the atomic changes of the field emitter surface which can be induced by the sputtering of the secondary ions, by surface diffusion of containment atoms, and by the dynamical behavior of the emitter surface itself. There are three major causes of the instability: (1) the ion-bombardment- or ion-sputtering-induced surface changes, (2) contamination and surface diffusion of contaminant-induced emission current fluctuations, and (3) the intrinsic thermal instability of the field emitter surface itself. A few possible means of alleviating these problems are discussed
Keywords :
electron field emission; vacuum microelectronics; atomic changes; contamination; emission current fluctuations; instability of field emission current; instability of field emitter surfaces; intrinsic thermal instability; ion sputtering; stabilisation; surface diffusion of containment atoms; Atomic layer deposition; Current-voltage characteristics; Electron emission; Field emitter arrays; Fluctuations; Impurities; Microelectronics; Sputtering; Stability; Surface contamination;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.88517
Filename :
88517
Link To Document :
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