Title :
Dynamic behavior and instability of field emitter surfaces
Author_Institution :
Dept. of Phys., Pennsylvania State Univ., University Park, PA, USA
fDate :
10/1/1991 12:00:00 AM
Abstract :
The instability of field emission current arises from the atomic changes of the field emitter surface which can be induced by the sputtering of the secondary ions, by surface diffusion of containment atoms, and by the dynamical behavior of the emitter surface itself. There are three major causes of the instability: (1) the ion-bombardment- or ion-sputtering-induced surface changes, (2) contamination and surface diffusion of contaminant-induced emission current fluctuations, and (3) the intrinsic thermal instability of the field emitter surface itself. A few possible means of alleviating these problems are discussed
Keywords :
electron field emission; vacuum microelectronics; atomic changes; contamination; emission current fluctuations; instability of field emission current; instability of field emitter surfaces; intrinsic thermal instability; ion sputtering; stabilisation; surface diffusion of containment atoms; Atomic layer deposition; Current-voltage characteristics; Electron emission; Field emitter arrays; Fluctuations; Impurities; Microelectronics; Sputtering; Stability; Surface contamination;
Journal_Title :
Electron Devices, IEEE Transactions on