DocumentCode
1408440
Title
Theory of emission noise from silicon field emitters
Author
Greene, Richard F.
Author_Institution
Dept. of Electr. Eng., North Carolina Univ., Charlotte, NC, USA
Volume
38
Issue
10
fYear
1991
fDate
10/1/1991 12:00:00 AM
Firstpage
2348
Lastpage
2349
Abstract
A calculation is made of the spectral density of emission fluctuations for silicon emitter tips for two emission mechanisms: emission mainly from surface states, and emission mainly from the conduction band edge. In both cases surface-state occupancy fluctuations, calculated from the generalized Nyquist formula, modulate the field emission current. The basic idea is that emission is likely to come from either surface states or from carriers in the conduction band, or both. If there are generation-recombination (G-R) fluctuations in the surface states at the emission surface, then there will be corresponding fluctuations from surface states. This G-R noise will also cause fluctuation in carrier concentrations in the emission area, and hence noise in emission from the conduction band. A discussion is given of whether the differing spectral densities for these two mechanisms may be compared with measurements to clarify which mechanism is dominant
Keywords
electron device noise; electron field emission; silicon; vacuum microelectronics; G-R noise; Si field emission; emission from conduction band edge; emission from surface states; emission mechanisms; field emission noise theory; generalized Nyquist formula; generation recombination noise; spectral density of emission fluctuations; surface-state occupancy fluctuations; 1f noise; Flat panel displays; Fluctuations; Industrial control; Kinetic theory; Microwave circuits; Noise level; Semiconductor device noise; Signal processing; Silicon;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.88523
Filename
88523
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