Title :
Frequency response of AlInAs/GaInAs/InP modulation-doped field-effect transistors at cryogenic temperatures
Author :
Adesida, I. ; Laskar, J. ; Boor, S. ; Reis, Sandro ; Ketterson, Andrew ; Cho, Andrew Y. ; Fischer, Ray ; Sivco, D.
fDate :
12/1/1988 12:00:00 AM
Abstract :
The microwave S-parameters of MODFETs have been measured at 300 and 90 K up to a frequency of 26.5 GHz. Measurements were made using a microwave network analyzer and a probe station that was modified for liquid-nitrogen-cooled operation. The MODFET layers included an Si-doped Al0.48In0.52As barrier and an undoped Ga 0.47In0.53As channel grown by molecular-beam epitaxy on a semi-insulating InP substrate. Results indicate a striking difference between the high-frequency responses at the two temperatures. At low frequencies the gain is higher at 90 K, where the maximum unilateral gain Gu at 1 GHz is 28 dB at 90 K vs. 20 dB at 300 K. At 300 K, Gu rolls off at 6 dB/octave and the maximum frequency of oscillations fmax, is 51 GHz. However, at 90 K, the gain roll-off steepens to 12 dB/octave and fmax is only 21 GHz. The roll-off in current gain is 6 dB/octave at both temperatures, and the current gain cutoff frequency, fT, is 33 GHz at 300 K and 41 GHz at 90 K. It was found that GaInAs MODFETs can have a lower frequency response at cryogenic temperatures than at room temperature. The measured 12 dB/octave roll-off rate of Gu indicates a second pole in the device response function
Keywords :
III-V semiconductors; S-parameters; aluminium compounds; cryogenics; frequency response; gallium arsenide; high electron mobility transistors; indium compounds; solid-state microwave devices; 1 to 51 GHz; 20 dB; 28 dB; 300 K; 90 K; Al0.48In0.52As:Si-Ga0.47In 0.53As-InP; III-V semiconductors; MBE; MODFETs; Si-doped Al0.48In0.52As barrier; cryogenic temperatures; frequency response; high-frequency responses; liquid-nitrogen-cooled operation; microwave S-parameters; microwave transistor; modulation-doped field-effect transistors; molecular-beam epitaxy; semi-insulating InP substrate; undoped Ga0.47In0.53As channel; Epitaxial layers; Frequency measurement; Frequency response; HEMTs; Indium phosphide; MODFETs; Microwave measurements; Molecular beam epitaxial growth; Probes; Temperature;
Journal_Title :
Electron Devices, IEEE Transactions on