DocumentCode :
1409498
Title :
A model-based approach for process design and its application to the titanium salicide process
Author :
Apte, Pushkar P. ; Saxena, Sharad ; Rao, Suraj ; Prinslow, Douglas A. ; Kittl, Jorge A. ; Pollack, Gordon P.
Author_Institution :
Texas Instrum. Inc., Dallas, TX, USA
Volume :
11
Issue :
3
fYear :
1998
fDate :
8/1/1998 12:00:00 AM
Firstpage :
475
Lastpage :
485
Abstract :
Process technology development constitutes a significant cost in manufacturing integrated circuits. In this paper, we present a model-based approach for developing new process technology rapidly and inexpensively, using the salicide process to demonstrate the concepts. This approach is applied to evaluate performance tradeoffs, to develop insight into the underlying process physics, to quantify the impact of the salicide process on the device and circuit performance, and to estimate the process variability. The key idea of this approach is to group a sequence of process steps into a process module, and build simple and accurate process models for the module. The paper also illustrates the use of this model-based approach in synthesizing optimal processes rapidly based on requirements, contributing to the reduction of technology development cost and cycle time
Keywords :
integrated circuit manufacture; integrated circuit metallisation; optimisation; semiconductor process modelling; titanium compounds; IC manufacturing; TiSi2; cycle time; model-based approach; optimal processes; performance tradeoffs; process design; process physics; process technology; process variability; salicide process; technology development cost; CMOS technology; Costs; Implants; Integrated circuit manufacture; Integrated circuit technology; Manufacturing processes; Process design; Semiconductor device modeling; Silicon; Titanium;
fLanguage :
English
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
Publisher :
ieee
ISSN :
0894-6507
Type :
jour
DOI :
10.1109/66.705382
Filename :
705382
Link To Document :
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