DocumentCode :
1409641
Title :
A Compact Capacitor-Less High-Speed DRAM Using Field Effect-Controlled Charge Regeneration
Author :
Wan, J. ; Le Royer, C. ; Zaslavsky, A. ; Cristoloveanu, S.
Author_Institution :
IMEP-LAHC, MINATEC, Grenoble, France
Volume :
33
Issue :
2
fYear :
2012
Firstpage :
179
Lastpage :
181
Abstract :
We demonstrate experimentally a capacitor-less one-transistor dynamic random access memory (DRAM) based on fully depleted silicon-on-insulator substrate. In our device, the charges are directly stored in front gate capacitor (CG) and read out through a fast feedback regeneration process. The simulated read/write times of our device reach below 1 ns, much faster than conventional 1T-1C DRAM. The read/write biasing voltages can be scaled down to 1.1 V, achieving long retention time (tre >; 5s).
Keywords :
DRAM chips; silicon-on-insulator; SOI; compact capacitor-less high-speed DRAM; conventional 1T-1C DRAM; dynamic random access memory; fast feedback regeneration process; field effect-controlled charge regeneration; front gate capacitor; fully depleted silicon-on-insulator substrate; read-write biasing voltages; retention time; simulated read-write times; Capacitors; Charge carrier processes; FETs; Junctions; Logic gates; Random access memory; Writing; Capacitor-less; dynamic random access memory (DRAM); feedback; high speed;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2011.2176908
Filename :
6112790
Link To Document :
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