DocumentCode :
1409941
Title :
The leakage currents of amorphous silicon thin-film transistors: channel charge emission
Author :
Lemmi, Francesco ; Street, Robert A.
Author_Institution :
Xerox Palo Alto Res. Center, CA, USA
Volume :
47
Issue :
12
fYear :
2000
fDate :
12/1/2000 12:00:00 AM
Firstpage :
2399
Lastpage :
2403
Abstract :
The effects of channel charge emission on the transient leakage currents of amorphous silicon thin-film transistors are described. Up to one hundred devices connected in parallel are used to allow measurement of currents below 1 fA. We develop a procedure to separate the charge-emmission current from the injection and generation currents, based on the dependence on the drain-to-source voltage. The channel emission current is isolated and measured from 10-3 to 100 s after the TFT is switched off. The current decays approximately as 1/t, and provides information about the density of states in a-Si:H. The channel charge emission also influences the read-out properties of active matrix arrays.
Keywords :
amorphous semiconductors; charge injection; elemental semiconductors; hydrogen; leakage currents; semiconductor device measurement; silicon; thin film transistors; 1 fA; 1E-3 to 100 s; Si:H; TFT; a-Si:H; active matrix arrays; amorphous silicon thin-film transistors; channel charge emission; density of states; drain-source voltage; generation currents; injection and generation currents; leakage currents; read-out properties; transient leakage currents; Amorphous silicon; Crystalline materials; Current measurement; Electron traps; Leakage current; Liquid crystal displays; Sensor arrays; Thin film transistors; Voltage; X-ray imaging;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.887028
Filename :
887028
Link To Document :
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