Title :
Behavior of N2 and nitrogen oxides in nonthermal plasma chemical processing of hazardous air pollutants
Author :
Futamura, Shigeru ; Zhang, Aihua ; Yamamoto, Toshiaki
Author_Institution :
Nat. Inst. for Resources & Environ., Ibaraki, Japan
Abstract :
Nonthermal plasma chemical behavior of N2-O2 mixed gases and nitrogen oxides such as N2O, NO, and NO2 was investigated to obtain baseline information on the generation of active oxygen species and the formation of inorganic byproducts in the nonthermal plasma chemical processing of hazardous air pollutants (HAPs) with a ferroelectric packed-bed reactor. Ozone concentrations were too low, even in air, to oxidatively decompose 300-1000 ppm of HAPs. The O2 concentration in N2-O2 was the determining factor in the formation of all the nitrogen oxides. N2O formation was enhanced with increases in O2 concentration and in specific energy density, while a threshold value was observed at around 5% of O2 concentration in the formation of NO and NO2. Rate-suppressing effect by O2, detailed byproduct analyses, and thermochemical data suggest that NOx decomposes in its reactions with nitrogen atoms derived from N2 dissociation, and that the unimolecular N-O cleavage predominantly occurs for N2O. The behavior of nitrogen oxides and their precursors was not affected by hydrogen atoms evolved from hydrogen-rich HAPs such as ethylene and benzene. Halogenated HAPs enhanced NOx formation and NO2 selectivity. Different additive effects of chlorinated and brominated HAPs were observed in the formation of NOx and N2O, indicating the involvement of different active oxygen species.
Keywords :
air pollution control; dissociation; ferroelectric devices; nitrogen; nitrogen compounds; plasma applications; plasma chemistry; N2 behaviour; N2 dissociation; N2-O2; N2-O2 mixed gases; N2O; NO; NO2; active oxygen species generation; additive effects; benzene; brominated hazardous air pollutants; chlorinated hazardous air pollutants; ethylene; ferroelectric packed-bed reactor; inorganic byproducts formation; nitrogen atoms reactions; nitrogen oxides; nitrogen oxides behaviour; nonthermal plasma chemical processing; ozone concentrations; rate-suppressing effect; specific energy density; thermochemical data; unimolecular N-O cleavage; Air pollution; Chemical hazards; Chemical processes; Chemical reactors; Ferroelectric materials; Gases; Inorganic chemicals; Nitrogen; Plasma chemistry; Plasma materials processing;
Journal_Title :
Industry Applications, IEEE Transactions on