Title :
Dual-gate AlGaN/GaN modulation-doped field-effect transistors with cut-off frequencies fT>60 GHz
Author :
Ching-Hui Chen ; Coffie, R. ; Krishnamurthy, K. ; Keller, S. ; Rodwell, M. ; Mishra, U.K.
Author_Institution :
Dept. of Electr. & Comput. Eng., California Univ., Santa Barbara, CA, USA
Abstract :
We demonstrate dual-gate AlGaN/GaN modulation-doped field-effect transistors (MODFETs) with gate-lengths of 0.16 μm and 0.35 μm for the first and second gates, respectively. The dual-gate device exhibits a current-gain cut-off frequency fT>60 GHz, and can simultaneously achieve a high breakdown voltage of >+100 V. In comparison to single-gate devices with the same gate length 0.16 μm, dual-gate FETs can significantly increase breakdown voltages, largely increasing the maximum allowable drain bias for high power application. The continuous wave (CW) output power is in excess of 3.5 W/mm at 8.2 GHz. The corresponding large-signal gain is 12 dB and the power added efficiency is 45%. The dual-gate device with different gate lengths shows the capability of providing simultaneous high cut-off frequencies, and high breakdown voltages for broadband power amplifiers.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; power amplifiers; wide band gap semiconductors; 0.16 mum; 0.35 mum; 12 dB; 45 percent; 60 GHz; 8.2 GHz; AlGaN-GaN; broadband power amplifiers; continuous wave output power; cut-off frequencies; gate-lengths; high breakdown voltage; large-signal gain; ual-gate AlGaN/GaN modulation-doped field-effect transistors; Aluminum gallium nitride; Cutoff frequency; Epitaxial layers; FETs; Gain; Gallium nitride; HEMTs; MODFETs; Power amplifiers; Power generation;
Journal_Title :
Electron Device Letters, IEEE