DocumentCode :
1411109
Title :
Roughness-enhanced electroluminescence from metal oxide silicon tunneling diodes
Author :
Liu, C.W. ; Lee, M.H. ; Chen, Miin-Jang ; Lin, Ching-Fuh ; Chern, M.Y.
Author_Institution :
Dept. of Electr. Eng., Nat. Taiwan Univ., Taipei, Taiwan
Volume :
21
Issue :
12
fYear :
2000
Firstpage :
601
Lastpage :
603
Abstract :
An approximate two-order increase in magnitude in electroluminescence was observed for the metal-oxide-silicon tunneling diodes with oxide grown at 900/spl deg/C, as compared to 1000/spl deg/C. The X-ray reflectivity revealed that the oxide grown at 900/spl deg/C has rougher interface than that grown at 1000/spl deg/C. The role of interface roughness can be understood in a model composed of phonons and interface roughness. An external quantum efficiency of /spl sim/10/sup -6/ was obtained using Al electrodes.
Keywords :
X-ray reflection; aluminium; electroluminescence; elemental semiconductors; interface phonons; interface roughness; light emitting diodes; semiconductor device measurement; silicon; silicon compounds; tunnel diodes; 1000 C; 900 C; Al electrodes; Si-SiO/sub 2/-Al; X-ray reflectivity; electroluminescence; external quantum efficiency; interface roughness; metal oxide silicon tunneling diodes; metal-oxide-silicon tunneling diodes; phonons; rough interface; roughness-enhanced electroluminescence; Electrodes; Electroluminescence; Light emitting diodes; MOS devices; Phonons; Reflectivity; Rough surfaces; Silicon; Surface roughness; Tunneling;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/55.887479
Filename :
887479
Link To Document :
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